SCIL Nanoimprint Solutions is a Netherlands-based startup founded in 2016, specializing in providing innovative solutions for patterning nano-structures on large wafers. The company's proprietary lithography technology, SCIL (Substrate Conformal Imprint Lithography), facilitates cost-effective, high-resolution patterning on various materials. With the capability to achieve feature sizes as small as less than 10 nm and overlay alignment down to 1 µm, SCIL's technology has garnered attention.
The recent €10.00M Seed Round investment secured on 12 December 2023 involved prominent investors including Imec.xpand, Invest-NL, RSBG Ventures, and BOM. This infusion of funds will likely bolster the startup's efforts to optimize equipment, consumable materials, and processes for high-volume production. SCIL's solutions have the potential to significantly enhance the performance, functionality, and cost efficiency of optics and photonic products manufactured by its clientele.
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