Noivion Coating, with the slogan "Thin film deposition by IJD pulsed electron ablation", specializes in designing and manufacturing thin film deposition equipment and components using their innovative technology: Ion Jet Deposition (IJD). The IJD method involves a pulsed electron source creating short and intense electric discharges within a vacuum, resulting in the emission of energetic material in the form of plasma which coats the object surface with a film made of the same material as the target. This technique offers advantages over traditional methods including conservation of stoichiometry, high growth rate, precise thickness and roughness control, low temperature deposition, compatibility with various materials, low cost, and robustness. Notably, the IJD technique is protected by international patents. Founded in 2012, Noivion Coating is a key player in the thin film deposition industry. However, the specific industries it operates in and its headquarters location are not specified. The company's last investment details, including the amount and investors involved, are currently unavailable. In summary, Noivion Coating has shown promise in revolutionizing thin film deposition with its patented IJD technology, offering superior advantages over conventional methods. Despite the limited information on recent investments and industries served, the company's innovative approach and potential for disruption are worth monitoring for interested venture capital firms.
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