LumArray, Inc. is developing a tool for microlithography that based on technology that was developed over the course of several years in the NanoStructures Laboratory at MIT. The technology is called Zone-Plate-Array Lithography (ZPAL). In contrast to the lithography techniques used in the semiconductor industry and in research, namely optical-projection lithography (OPL) and contact lithography (CL), LumArray's ZPAL tool does not employ a mask; that is, it is "maskless." This enables rapid turn around on designs and economic manufacturing when only small volumes are requires.
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